Accession Number : AD0163626

Title :   Anodic Sputtering.

Descriptive Note : Patent,

Corporate Author : OFFICE OF THE SECRETARY OF THE ARMY WASHINGTON D C

Personal Author(s) : Jennings,Thomas A. ; McNeill,William

Report Date : 30 MAR 1971

Pagination or Media Count : 4

Abstract : The patent describes processes for anodizing or sputtering metal anodes, or for sputtering and anodizing valve metal anodes such as tantalum substantially simultaneously, by electrically connecting the anode in a vacuum vessel and controllably impacting the anode with negative ions. Anodization will occur when lower voltages are employed to propel the negative ions toward the anode whereas higher voltages will result in sputtering of the anode. Intermediate voltages will produce the phenomenon of sputtering and anodization of suitable surfaces.

Descriptors :   (*SPUTTERING, *ANODIC COATINGS), (*PATENTS, SPUTTERING), TANTALUM

Subject Categories : Coatings, Colorants and Finishes
      Fabrication Metallurgy

Distribution Statement : APPROVED FOR PUBLIC RELEASE