Accession Number : AD0164067
Title : Furnace for Treating Material in a Gas Atmosphere.
Descriptive Note : Patent,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON D C
Personal Author(s) : Kagdis,William Anthony ; Tanski,John Julian , Sr
Report Date : 03 FEB 1970
Pagination or Media Count : 5
Abstract : The patent describes a furnace useful in treating semiconductor wafers by means of a gas atmosphere. The furnace is oriented vertically and comprises an outer chamber provided with gas inlet and gas outlet ports; means for creating turbulence in the admitted gas and means for imparting motion to the wafers to insure that the wafers are uniformly acted upon by the gas; means for providing the wafers with an inert gas cover when no treatment is desired; and means for safely removing residual gas from the furnace.
Descriptors : (*FURNACES, CONTROLLED ATMOSPHERES), (*PATENTS, FURNACES), SEMICONDUCTORS, DISKS, DIFFUSION, GAS FLOW
Subject Categories : Air Condition, Heating, Lighting & Ventilating
Distribution Statement : APPROVED FOR PUBLIC RELEASE