Accession Number : AD0164085

Title :   Photoresist Processing Method for Fabricating Etched Microcircuits.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON D C

Personal Author(s) : Croson,Eddie B.

Report Date : 24 OCT 1972

Pagination or Media Count : 11

Abstract : The patent describes a photoresist process especially suitable for fabricating etched thin-film microcircuits. By the use of both positive and negative photoresists during the same processing cycle, most mask alignment problems are eliminated. Also, since only a single post-bake period is necessary, a major reduction in overall processing time is achieved.

Descriptors :   (*Integrated circuits, *Photoengraving), (*Patents, Photoengraving), Manufacturing methods, Etching, Films, Masking

Subject Categories : Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE