Accession Number : AD0164085
Title : Photoresist Processing Method for Fabricating Etched Microcircuits.
Descriptive Note : Patent,
Corporate Author : DEPARTMENT OF THE NAVY WASHINGTON D C
Personal Author(s) : Croson,Eddie B.
Report Date : 24 OCT 1972
Pagination or Media Count : 11
Abstract : The patent describes a photoresist process especially suitable for fabricating etched thin-film microcircuits. By the use of both positive and negative photoresists during the same processing cycle, most mask alignment problems are eliminated. Also, since only a single post-bake period is necessary, a major reduction in overall processing time is achieved.
Descriptors : (*Integrated circuits, *Photoengraving), (*Patents, Photoengraving), Manufacturing methods, Etching, Films, Masking
Subject Categories : Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE