Accession Number : AD0164635

Title :   Photomechanical Method of Producing Grounded Printed Circuits.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON D C

Personal Author(s) : Bemis,Stuart A.

Report Date : 27 NOV 1973

Pagination or Media Count : 7

Abstract : The patent describes a photomechanical method of producing a grounded printed circuit utilizes an ungrounded circuit negative, a base film and a diffuser sandwiched therebetween to produce a negative mask having a spread image thereon. This negative mask is used in conjunction with the original ungrounded circuit negative to produce a composite positive which contains the required ground plane and upon which any further terminal grounding can be made. The resultant grounded composite negative is utilized to form the grounded printed circuit.

Descriptors :   *Printed circuits, *Photolithography, *Patents, Photomasking, Electrical grounding

Subject Categories : Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE