Accession Number : AD0164878

Title :   Photomechanical Method of Producing Grounded Printed Circuits.

Descriptive Note : Patent,

Corporate Author : DEPARTMENT OF THE AIR FORCE WASHINGTON D C

Personal Author(s) : Bemis,Stuart A.

Report Date : 27 NOV 1973

Pagination or Media Count : 7

Abstract : The patent describes a photomechanical method of producing a grounded printed circuit utilizing an ungrounded circuit negative, a base film and a transparent sheet sandwiched therebetween. This film package is mounted on a turntable and exposed to a light source while the turntable is being rotated. Development of the exposed base film produces a negative mask. This negative mask is used in conjunction with the original ungrounded circuit negative to produce a composite positive which contains the required ground plane and upon which any further terminal grounding can be made. The resultant grounded composite negative is utilized to form the grounded printed circuit.

Descriptors :   *Printed circuits, *Photolithography, *Patents, Masking, Electrical grounding, Fabrication

Subject Categories : Electrical and Electronic Equipment

Distribution Statement : APPROVED FOR PUBLIC RELEASE