Accession Number : AD0290258

Title :   THE MECHANISM OF OXIDE FORMATION IN THE INITIAL STAGES OF OXIDATION

Corporate Author : OHIO STATE UNIV RESEARCH FOUNDATION COLUMBUS

Personal Author(s) : RAUSCH,D.W. ; MOAZED,K.L. ; FONTANA,M.G.

Report Date : 14 NOV 1962

Pagination or Media Count : 1

Abstract : Work comprised field emission experiments in which O at pressures between 10 to the -10th and 10 to the -4th power mm Hg was reacted with clean W and Ta substrates at temperatures between 25 and 2000C. The random nucleation of a distinct second phase was observed on tantalum at 830 and 1135C. Marked differences between the course of reaction of O on W and of O on Ta are becoming apparent. Considerable difficulty was encountered in developing a reproducible technique for the cleaning of Ta emitter-substrates. The most recent method developed, however, did produce a clean tantalum emission pattern very readily without the use of field evaporation. (Author)

Descriptors :   *COMBUSTION, *OXIDATION, *OXIDES, *OXYGEN, CLEANING, ELECTROLYTIC POLISHING, FIELD EMISSION, GASES, HIGH TEMPERATURE, LOW PRESSURE, TANTALUM, THERMAL RADIATION, TUNGSTEN, VACUUM APPARATUS

Distribution Statement : APPROVED FOR PUBLIC RELEASE