Accession Number : AD0434912

Title :   ELECTRON AFFINITIES OF INORGANIC RADICALS.

Descriptive Note : Final technical rept., 1 Feb 63-31 Jan 64,

Corporate Author : COLLEGE OF ADVANCED TECHNOLOGY BIRMINGHAM (ENGLAND)

Personal Author(s) : Page,F. M.

Report Date : 31 JAN 1964

Pagination or Media Count : 11

Abstract : Work has been devoted to the problem of substrates which are strongly adsorbed on the filament in the magnetron. The results from tetracyanoethylene proved most illuminating with regard to understanding the general magnetron theory. Tetracyanoquinodimethine proved to have a low vapour pressure at room temperature and part of the apparatus has been reconstructed in order to allow heating of the magnetron envelope. The work on SF6 which presented many complications, due to the strong oxidising powers of the SF5 radical, has been completed. The compound SF6 is of considerable importance to the electrical industry as a gaseous dielectric. Its high electrical breakdown properties are associated with the ease of formation of SF5 (-) ions. The electron affinities of nitric oxide and nitrogen peroxide have been determined, and evidence found for the existence of an excited state of the NO2(-) ion which lies 92 kcals above its ground state. Some preliminary work has been done using 50% aqueous hydrogen peroxide in an attempt to find the electron affinity of the important (OH) radical. First results on the more dilute solution show the electron affinity of the OH radical to be higher than the presently favoured value. (Author)

Descriptors :   (*FREE RADICALS, IONIZATION), (*IONS, FREE RADICALS), ELECTRONS, NITRILES, ALKENES, SULFUR COMPOUNDS, FLUORINE COMPOUNDS, NITROGEN COMPOUNDS, OXIDES, COPPER COMPOUNDS, OXIDES, NITRATES, HYDROGEN PEROXIDE, MAGNETRONS

Distribution Statement : APPROVED FOR PUBLIC RELEASE