Accession Number : AD0454939
Title : INVESTIGATION OF ULTRA HIGH VACUUM SPUTTERED THIN FILMS.
Descriptive Note : Scientific rept. no. 2, May-30 Nov 64,
Corporate Author : MALLORY (P R) AND CO INC BURLINGTON MA
Personal Author(s) : Wolsky, S. P.
Report Date : 30 NOV 1964
Pagination or Media Count : 27
Abstract : Germanium films were sputtered onto quartz and self-substrates in a low-pressure thermionically supported discharge. Reflection electron diffraction and x-ray examination showed that over comparable temperature ranges the orientation of sputtered geranium on quartz films differed from that of evaporated films. Epitaxy was observed on self-substrates at 150 C. Electrical characteristics of evaporated and sputtered films were strikingly similar despite wide variation in substrate material and temperature and in deposition rates. (Author)
Descriptors : (*GERMANIUM, FILMS), (*FILMS, MATERIAL FORMING), (*METAL FILMS, SPUTTERING), LOW PRESSURE, ELECTRON DIFFRACTION, ELECTRICAL PROPERTIES, EPITAXIAL GROWTH, X RAY DIFFRACTION, SEMICONDUCTORS.
Distribution Statement : APPROVED FOR PUBLIC RELEASE