Accession Number : AD0474420
Title : STUDY OF COMPREHENSIVE FAILURE THEORY.
Descriptive Note : Final rept. 28 Feb 64-28 Nov 64,
Corporate Author : IIT RESEARCH INST CHICAGO IL
Personal Author(s) : Goldberg, M. ; Hand, F. ; Horberg, A. ; Parikh, N.
Report Date : OCT 1965
Pagination or Media Count : 206
Abstract : Principal operative mechanisms contributing to the degradation of Evanohm deposited film resistors are identified. Studies of oxidation kinetics are described, chemical analysis are given, and evidence of the influence of film thickness on reliability testing is presented. (Author)
Descriptors : (*RESISTORS, METAL FILMS), (*FAILURE(ELECTRONICS), MATHEMATICAL MODELS), THICKNESS, AGING(MATERIALS), OXIDATION, ELECTRICAL RESISTANCE, CHEMICAL PRECIPITATION, MEASUREMENT, LEAST SQUARES METHOD, COMPUTER PROGRAMMING, SUBSTRATES, RELIABILITY(ELECTRONICS).
Subject Categories : Electrical and Electronic Equipment
Electricity and Magnetism
Distribution Statement : APPROVED FOR PUBLIC RELEASE