Accession Number : AD0489378
Title : PROPERTIES OF TITANIUM AND RUTILE (TIO2) THIN FILMS.
Descriptive Note : Technical rept. Oct 64-Feb 66,
Corporate Author : MASSACHUSETTS INST OF TECH CAMBRIDGE PHOTOCONDUCTIVE SEMICONDUCTORS AND DEVIC ES LAB
Personal Author(s) : Arntz, Floyd Olaf
Report Date : MAR 1966
Pagination or Media Count : 33
Abstract : The structure of titanium films deposited in ultrahigh vacuum upon various substrates has been studied as a function of deposition conditions and substrate preparation. Films exhibiting structures ranging in refinement from random polycrystalline to single crystal alpha-titanium have been obtained. Rutile (TiO2) films generated by thermal oxidation of the above exhibited various orientational developments, depending primarily upon the structure of the originals. These relationships and the various techniques employed are described herein. In addition, ultraviolet absorption spectra of the rutile films were obtained. Correlation between the structures of the oxide and the ultraviolet absorption spectra permitted the assignment of major features of the latter to the absorption of particular polarizations of light determined with respect to the axes of rutile. (Author)
Descriptors : *METAL FILMS), (*RUTILE, FILMS), (*TITANIUM, VAPOR PLATING, SINGLE CRYSTALS, SUBSTRATES, OXIDATION, OXIDES, CRYSTAL STRUCTURE, ABSORPTION SPECTRA, ULTRAVIOLET RADIATION.
Subject Categories : Metallurgy and Metallography
Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE