Accession Number : AD0603715

Title :   INTEGRATED SILICON DEVICE TECHNOLOGY. VOLUME III. PHOTOENGRAVING.

Descriptive Note : Rept. for Aug-Nov 63,

Corporate Author : RESEARCH TRIANGLE INST DURHAM N C

Personal Author(s) : Wortman,J. J.

Report Date : JAN 1964

Pagination or Media Count : 80

Abstract : Within the limits of available information, this report describes typical photoengraving techniques used in silicon integrated device technology. The various types of photoresists and photosensitive coatings are described along with their known properties. Step-by-step procedures are included for the use of these resists. A general evaluation of the photoengraving process and its limits is included. (Author)

Descriptors :   (*SEMICONDUCTOR DEVICES, SILICON), (*PHOTOENGRAVING, INTEGRATED CIRCUITS), (*INTEGRATED CIRCUITS, PHOTOENGRAVING), MANUFACTURING, SILICON COATINGS, PHOTOSENSITIVITY, PRINTING, CLEANING, PHOTOGRAPHY

Distribution Statement : APPROVED FOR PUBLIC RELEASE