Accession Number : AD0615971

Title :   INVESTIGATION F ULTR HIGH VACUUM SPUTTERED THIN FILMS,

Corporate Author : MALLORY (P R) AND CO INC BURLINGTON MASS

Personal Author(s) : Wallis,George ; Pittelli,Ernest

Report Date : 30 APR 1965

Pagination or Media Count : 33

Abstract : Minor modifications in the construction of the vacuum chamber and changes in the outgassing schedule were made in order to reduce background pressure during sputtering. Single crystal sapphire and calcium fluoride were added to the substrate materials under investigation. Thick films with improved structural and electrical characteristics were grown. A paper was completed on the electrical characteristics of vacuum deposited germanium films. The paper which is included in the report attempts to account quantitatively for the electrical behavior of the films. (Author)

Descriptors :   (*GERMANIUM, ELECTRICAL PROPERTIES), (*SEMICONDUCTORS, FILMS), (*FILMS, GERMANIUM), VACUUM APPARATUS, SPUTTERING, VAPOR PLATING, SINGLE CRYSTALS, CRYSTAL DEFECTS, SAPPHIRE, SCATTERING, TEMPERATURE, PROBABILITY, METAL CRYSTALS, VALENCE

Distribution Statement : APPROVED FOR PUBLIC RELEASE