Accession Number : AD0617242

Title :   THE EFFECT OF POLARIZATION, FIELD STRESS, AND GAS IMPACT ON THE TOPOGRAPHY OF FIELD EVAPORATED SURFACES,

Corporate Author : PENNSYLVANIA STATE UNIV UNIVERSITY PARK

Personal Author(s) : Muller,E. W.

Report Date : 1964

Pagination or Media Count : 12

Abstract : Field evaporation of pure metals can produce highly perfect surfaces. The field evaporation end form is established by balancing the local field at the evaporation site with the binding energy of the evaporating metal atom. A considerable part of this energy is due to polarization which can be described by field penetration rather than by the polarizability of the free atom. Polarization also stabilizes characteristic low-coordination sites. In several metals the field stress causes specific lattice defects. The field evaporation end form is further modified by the presence of the imaging gas when the molecules effectively transfer their dipole attraction energy in the collision with surface atoms. (Author)

Descriptors :   (*FIELD EMISSION, METALS), (*SURFACE PROPERTIES, METAL CRYSTALS), (*CRYSTAL DEFECTS, METAL CRYSTALS), POLARIZATION, STRESSES, ELECTRON MICROSCOPY, CRYOGENICS, METAL FILMS, EVAPORATION

Distribution Statement : APPROVED FOR PUBLIC RELEASE