Accession Number : AD0617893
Title : PRODUCTION ENGINEERING MEASURE FOR IMPROVEMENT OF PRODUCTION TECHNIQUES TO INCREASE THE RELIABILITY FOR PNP INTERMEDIATE POWER SILICON PLANAR SWITCHING TRANSISTORS INCLUDING 2N3502.
Descriptive Note : Quarterly progress rept. no. 1, 1 Jan-31 Mar 65,
Corporate Author : FAIRCHILD CAMERA AND INSTRUMENT CORP MOUNTAIN VIEW CALIF FAIRCHILD SEMICONDUCTOR DIV
Personal Author(s) : Dorilag,R. C. ; Diepeveen,J. C.
Report Date : 31 MAR 1965
Pagination or Media Count : 30
Abstract : Thorough evaluation of the test results, accumulated during the operation of the test-masking line built by Fairchild, proved the feasibility of the mechanized semiautomatic masking process. However, a modification of the mechanical concept was necessary for the post exposure part. Through a long term systematically determined evaluation program, it was found that improvements had to be made in certain areas of the Optical Alignment Jig. The areas were in the Microscope Assembly, Light Source Assembly and Chuck and Positioner Assembly. A preliminary survey of the 2N3502 devices was made. The survey indicated that Beta variation is most pronounced in the vertical direction of a wafer; it is maximum on top of the wafer and minimum at the bottom. This directional, rather than random variation of Beta, indicated several possible causes, some of which have been investigated. (Author)
Descriptors : (*TRANSISTORS, MANUFACTURING), RELIABILITY(ELECTRONICS), SILICON, PROCESSING, COATINGS, CONVEYORS, JIGS, IMPURITIES, DISKS, PERFORMANCE(ENGINEERING)
Distribution Statement : APPROVED FOR PUBLIC RELEASE