Accession Number : AD0634882

Title :   DENDRITIC SILICON SOLAR CELLS AND UTILIZATION EXPERIENCE,

Corporate Author : AIR FORCE AERO PROPULSION LAB WRIGHT-PATTERSON AFB OHIO

Personal Author(s) : Wise, Joseph

Report Date : 1966

Pagination or Media Count : 26

Abstract : The method of fabrication for dendritic silicon solar cells of 30 sq centimeters is described; both conventional N on P and N on P drift-field cells are included. The N on P cells are formed through diffusion of phosphorus on the top surface; the drift-field cells, through epitaxial growth of a 40-micron layer on a segment of dendritic silicon web material followed by phosphorous diffusion, anti-reflection coatings, and integral quartz coatings. Experience in fabricating these cells and in utilizing them on a flexible array is summarized and their potentials for lower weight, longer life, and lower cost are assessed; space performance estimates also are included. The use of the ion implantation junction formation in the fabrication of highly efficient, thin dendritic silicon solar cells also is outlined. Measurements accomplished at the Air Force Aero Propulsion Laboratory on the various cell types are included. (Author)

Descriptors :   (*SOLAR CELLS, SILICON), EPITAXIAL GROWTH, PHOSPHORUS, DIFFUSION, COATINGS, QUARTZ, PERFORMANCE(ENGINEERING), SOLAR PANELS, ELECTRIC POWER PRODUCTION

Subject Categories : Electric Power Production and Distribution

Distribution Statement : APPROVED FOR PUBLIC RELEASE