Accession Number : AD0635143
Title : PHOTOMETALLIC PROCESS INVESTIGATION.
Descriptive Note : Interim development rept. no. 2, 1 Mar-31 May 66.
Corporate Author : GENERAL ELECTRIC CO SCHENECTADY N Y RESEARCH AND DEVELOPMENT CENTER
Personal Author(s) : Schaefer, D. L. ; Burgess,J. F.
Report Date : 14 JUN 1966
Pagination or Media Count : 26
Abstract : The project has as its ultimate objective the fabrication of microminiature circuits in gold, nichrome, aluminum and silica by a process in which these materials are etched directly by a photosensitive material according to an incident light pattern. The evaluation of potential light sensitive halogens was extended. Spectrophotometric studies of chloro, bromo and iodo systems for etching gold were conducted. Etchant products are identified and etching mechanisms are proposed. Studies of the compatibility of polymers, solvents, and photo etchants were conducted. Reaction rate studies were initiated. The production of circuit patterns in gold and nichrome by several photometallic systems was demonstrated. (Author)
Descriptors : (*PHOTOENGRAVING, INTEGRATED CIRCUITS), (*INTEGRATED CIRCUITS, PREPARATION), (*ETCHING, *PHOTOCHEMICAL REACTIONS), GOLD, NICKEL ALLOYS, CHROMIUM ALLOYS, CHLORINE COMPOUNDS, BROMINE COMPOUNDS, IODINE COMPOUNDS, PHOTOSENSITIVITY, SPECTROSCOPY, PHOTOLYSIS, POLYMERS, SOLVENTS, COMPATIBILITY, REACTION KINETICS, MICROELECTRONICS
Subject Categories : Radiation and Nuclear Chemistry
Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE