Accession Number : AD0658072

Title :   APPLICATION OF THE AUGER PROCESS TO THE STUDY OF GASEOUS ADSORPTION ON TUNGSTEN,

Corporate Author : ILLINOIS UNIV URBANA COORDINATED SCIENCE LAB

Personal Author(s) : Tibbetts,Gary

Report Date : AUG 1967

Pagination or Media Count : 145

Abstract : Apparatus is described which allows the density of gas adsorbed on metal surfaces to be monitored by observing changes in the number of electrons ejected from the surface by a constant-current, low-energy ion beam. It is shown that the electron emission process (an Auger process) is temperature independent; thus, surface coverages may be easily compared at different temperatures. Adsorption at room temperature and at the temperature of liquid nitrogen was studied by flash filament and Auger techniques. Desorption kinetics of H2, CO, and N2 from polycrystalline, (110), and (111) tungsten foils are discussed.

Descriptors :   (*CHEMISORPTION, TUNGSTEN), (*TUNGSTEN, ADSORPTION), (*ELECTRON TRANSITIONS, ADSORPTION), SURFACES, ION BOMBARDMENT, ELECTRONS, EMISSIVITY, HYDROGEN, CARBON MONOXIDE, NITROGEN, FOILS(MATERIALS), MOLECULAR ENERGY LEVELS, FIELD EMISSION, CRYOGENICS, SINGLE CRYSTALS, MOLECULAR ASSOCIATION, LABORATORY EQUIPMENT

Subject Categories : Atomic and Molecular Physics and Spectroscopy
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE