Accession Number : AD0669053
Title : A PARAMETRIC STUDY OF THIN FILMS OF TANTALUM-NITROGEN COMPOUNDS.
Descriptive Note : Technical rept.,
Corporate Author : AIR FORCE AVIONICS LAB WRIGHT-PATTERSON AFB OHIO
Personal Author(s) : Buvinger,E. A.
Report Date : FEB 1968
Pagination or Media Count : 13
Abstract : Thin films of tantalum-nitrogen compounds were deposited by reactive sputtering onto quartz substrates for electrical and optical measurements and onto carbon-coated grids for electron diffraction analysis using hot- and cold-stage techniques. The films were deposited at substrate temperatures varying from room temperature to 500C at sputtering voltages varying from 1 to 5 kV. The relationship between nitrogen content and lattice structure is presented and compared with resistivity and optical absorption measurements. (Author)
Descriptors : (*TANTALUM COMPOUNDS, METAL FILMS), (*NITRIDES, FILMS), TANTALUM, SPUTTERING, GLOW DISCHARGES, ELECTRON DIFFRACTION, CRYSTAL DEFECTS, ELECTRICAL RESISTANCE, ABSORPTION SPECTRA
Subject Categories : Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE