Accession Number : AD0669053

Title :   A PARAMETRIC STUDY OF THIN FILMS OF TANTALUM-NITROGEN COMPOUNDS.

Descriptive Note : Technical rept.,

Corporate Author : AIR FORCE AVIONICS LAB WRIGHT-PATTERSON AFB OHIO

Personal Author(s) : Buvinger,E. A.

Report Date : FEB 1968

Pagination or Media Count : 13

Abstract : Thin films of tantalum-nitrogen compounds were deposited by reactive sputtering onto quartz substrates for electrical and optical measurements and onto carbon-coated grids for electron diffraction analysis using hot- and cold-stage techniques. The films were deposited at substrate temperatures varying from room temperature to 500C at sputtering voltages varying from 1 to 5 kV. The relationship between nitrogen content and lattice structure is presented and compared with resistivity and optical absorption measurements. (Author)

Descriptors :   (*TANTALUM COMPOUNDS, METAL FILMS), (*NITRIDES, FILMS), TANTALUM, SPUTTERING, GLOW DISCHARGES, ELECTRON DIFFRACTION, CRYSTAL DEFECTS, ELECTRICAL RESISTANCE, ABSORPTION SPECTRA

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE