Accession Number : AD0674120

Title :   BASIC PLASMA PROCESSES.

Descriptive Note : Summary technical rept. 1 Jul 67-30 Jun 68,

Corporate Author : WESTINGHOUSE RESEARCH LABS PITTSBURGH PA ATOMIC AND MOLECULAR SCIENCES

Personal Author(s) : Phelps,A. V. ; Chen,C. L.

Report Date : 1968

Pagination or Media Count : 43

Abstract : Measurements of the magnitude and wavelength dependence of the specular reflection of light in the vicinity of the cesium resonance lines from a cesium-sapphire interface verify the Taylor-Langmuir formula for the vapor pressure of cesium in the temperature range from 500 to 600K. This result eliminates the Cs density as a source of systematic error in our previous measurements of the self-broadening of the Cs resonance lines at 8521 and 8944A. Measurements have been made of the total amount of diffusely scattered resonance radiation for pure Cs and for Cs-nitrogen mixtures at Cs densities between 10 to the 14th power and 10 to the 16th power atom/cu cm. A preliminary analysis of this data shows that the method is capable of yielding quenching cross sections at high alkali vapor densities. Some features of the results, such as the apparent quenching caused by pure Cs, are not yet understood. (Author)

Descriptors :   (*PLASMAS(PHYSICS), *ENERGY CONVERSION), (*CESIUM, PLASMAS(PHYSICS)), RESONANCE, REFLECTION, VAPOR PRESSURE, SCATTERING, QUENCHING(INHIBITION), SAPPHIRE, INTERFACES, EXCITATION, LINE SPECTRA, IONIZATION, LIGHT TRANSMISSION, THERMIONIC CONVERTERS, MAGNETOHYDRODYNAMIC GENERATORS

Subject Categories : Electric Power Production and Distribution
      Plasma Physics and Magnetohydrodynamics

Distribution Statement : APPROVED FOR PUBLIC RELEASE