Accession Number : AD0681767

Title :   HIGH ACCURACY THICKNESS MEASUREMENT OF ELECTRON TRANSPARENT EVAPORATED SILVER FILMS,

Corporate Author : GENERAL DYNAMICS/ASTRONAUTICS SAN DIEGO CALIF

Personal Author(s) : Poppa,H. R.

Report Date : 12 APR 1961

Pagination or Media Count : 21

Abstract : High accuracy thickness measurements of evaporated silver films can be obtained by electron absorption measurements in an electron microscope. The method is particularly applicable to the detection of removal of surface layers of electron transparent thin film specimens. The removal of one monolayer can be detected. The calibration process for evaporated silver films is described in detail. The same technique is suitable for any type of thin film manufacturing process that produces thin films of equal thickness over an area of at least (3mm) squared. The capability of the method is demonstrated by measuring the sputtering yield constant of silver bombarded by argon ions inside the electron microscope. (Author)

Descriptors :   (*METAL FILMS, THICKNESS), MEASUREMENT, SILVER, CALIBRATION, VAPOR PLATING, VACUUM APPARATUS, SPUTTERING, ELECTRON MICROSCOPY, SURFACE PROPERTIES

Subject Categories : Metallurgy and Metallography
      Test Facilities, Equipment and Methods

Distribution Statement : APPROVED FOR PUBLIC RELEASE