Accession Number : AD0692184

Title :   THE NATURE OF INDUCED ANISOTROPY,

Corporate Author : FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Personal Author(s) : Lesnik,A. G. ; Levin,G. I. ; Nedostup,V. M.

Report Date : 04 FEB 1969

Pagination or Media Count : 13

Abstract : Current literature on magnetic anisotropy induced in ferromagnetic films during deposition is reviewed. The effects on anisotropy of thermal anneals, defects, impurity atoms, and mechanical stresses are considered. On the basis of the data on the kinetics of the processes occurring during the annealing one can draw the following conclusion: Base temperatures of about 100 degrees C are special in the sense that below and above this temperature the kinetics of the processes are accelerated. Possibly the phenomenon below 100 degrees C is in part related to some decrease in activation energy of the processes in connection with an increase in stress in the film with a decrease in base temperature. This assumption seems entirely valid, since with a decrease in base temperature the total number of point defects and the relative fraction of unordered vacancies increases. The reasons for the acceleration of the kinetics of the processes in films obtained at a temperature above 100 degrees C are still not clear. It is noted that there is much interest in studying the effects of impurities and rate of deposition on the kinetics of the formation of anisotropy. (Author)

Descriptors :   (*THIN FILM STORAGE DEVICES, METAL FILMS), (*FERROMAGNETIC MATERIALS, ANISOTROPY), ANNEALING, NICKEL ALLOYS, IRON ALLOYS, STRESSES, VAPOR PLATING, VACUUM APPARATUS, FILMS, USSR

Subject Categories : Computer Hardware
      Electricity and Magnetism
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE