Accession Number : AD0695888

Title :   NEW VACUUM EQUIPMENT FOR DEPOSITING THIN FILMS,

Corporate Author : FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Personal Author(s) : Churkin,E. V. ; Yugov,V. A.

Report Date : 21 MAY 1969

Pagination or Media Count : 20

Abstract : A new device for depositing thin metal films in a vacuum is presented, and its application for depositing thin film electrodes on quartz resonators is discussed in detail. The apparatus permits elements to be coated and sealed without exposing them to the atmosphere and makes possible electrodes of any configuration. It can also be used to adjust oscillation frequency to nominal. (Author)

Descriptors :   (*VAPOR PLATING, *VACUUM APPARATUS), METAL FILMS, INDUSTRIAL EQUIPMENT, SUBSTRATES, QUARTZ RESONATORS, USSR

Subject Categories : Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE