Accession Number : AD0698108

Title :   VACUUM DEPOSITION OF THIN FILMS,

Corporate Author : FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Personal Author(s) : Danilin,B. S.

Report Date : 15 AUG 1969

Pagination or Media Count : 334

Abstract : The book deals with methods of obtaining and processing thin films, methods of measuring the deposition rate and thickness of thin-film layers, and the main fields of application of thin films. Vacuum requirements and the requirements for the composition of the residual medium in thermal evaporation and cathode sputtering are given, and modern methods of producing and measuring vacuums and the equipment used in obtaining thin films are described. (Author)

Descriptors :   (*VAPOR PLATING, VACUUM APPARATUS), (*FILMS, DEPOSITION), STATE-OF-THE-ART REVIEWS, METAL FILMS, SEMICONDUCTING FILMS, DIELECTRIC FILMS, OPTICAL COATINGS, SPUTTERING, SPRAYS, VACUUM PUMPS, EVAPORATORS, THICKNESS, MANUFACTURING, INTEGRATED CIRCUITS, MICROELECTRONICS, THIN FILM STORAGE DEVICES, SUPERHIGH FREQUENCY, MASS SPECTROSCOPY, SPECTRUM ANALYZERS, USSR

Subject Categories : Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE