Accession Number : AD0701730

Title :   A KINETIC STUDY OF THE THERMAL DECOMPOSITION OF SELECTED CYCLOHEXYL AND PHENYLSILANES.

Descriptive Note : Final rept. 1 May 64-30 Jun 69,

Corporate Author : BATTELLE MEMORIAL INST COLUMBUS OHIO COLUMBUS LABS

Personal Author(s) : Coutant,Robert W. ; Levy,Arthur

Report Date : DEC 1969

Pagination or Media Count : 35

Abstract : The thermal-decompositon kinetics of the following arylsilanes have been investigated using both static and flow techniques: monophenylsilane, diphenylsilane, triphenylsilane, tetraphenylsilane, diphenyldimethylsilane, and triphenylmethylsilane. The phenylhydrosilanes decompose via a bimolecular second-order redistribution reaction, with no evidence for free-radical formation. On the other hand, the main mode of decomposition of tetraphenylsilane involves elimination of phenyl radicals followed by attack of these radicals on the parent silane. The decomposition of the phenylmethylsilanes also proceeds via free-radical mechanism, but the main reaction path results in intramolecular cyclization, yielding compounds containing the dibenzosilole nucleus. Reasons for these three basically different modes of reaction are discussed in terms of substituent size and degree of (p-d)pi bonding between the phenyl rings and silicon. (Author)

Descriptors :   (*SILANES, *PYROLYSIS), REACTION KINETICS, FREE RADICALS, CHEMICAL BONDS

Subject Categories : Physical Chemistry

Distribution Statement : APPROVED FOR PUBLIC RELEASE