Accession Number : AD0702964

Title :   SOME PROPERTY CHANGE IN PYROLITIC SiO2 FILMS AFTER THERMAL TREATMENT,

Corporate Author : FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Personal Author(s) : Kalnynya,R. P. ; Feltyn,I. A. ; Freiberg,L. A. ; Eglitis,I. E.

Report Date : 08 JAN 1970

Pagination or Media Count : 16

Abstract : Changes in the etch rate, refractive index, and infrared absorption spectra for pyrolitic SiO2 films, along with variations in the volt-ampere characteristics for Ag-SiO2-Ge structures, after thermal treatment in various gas media have been studied. It has been established that thermal treatment of pyrolitic SiO2 films has the effect of stabilizing all the properties considered. The treatment of films in water vapor at temperatures above 70 degrees centigrade has proven to be the most effective. It has been found that the properties which depend on the etch rate of the films become stable in a shorter time than the volt-ampere characteristics. Thermal treatment exercises a substantial effect particularly on films grown in an oxygen medium at low temperatures. (Author)

Descriptors :   (*SILICON DIOXIDE, *FILMS), (*SILANES, *PYROLYSIS), DEPOSITION, INFRARED SPECTRA, USSR

Subject Categories : Coatings, Colorants and Finishes
      Atomic and Molecular Physics and Spectroscopy

Distribution Statement : APPROVED FOR PUBLIC RELEASE