Accession Number : AD0710380

Title :   SPUTTERING FROM OBLIQUE ION INCIDENCE USING COMPUTER SIMULATION TECHNIQUE.

Descriptive Note : Master's thesis,

Corporate Author : NAVAL POSTGRADUATE SCHOOL MONTEREY CALIF

Personal Author(s) : Holcombe,Horace Truman

Report Date : JUN 1970

Pagination or Media Count : 47

Abstract : A self-contained computer simulation of sputtering from 20 keV incident ions is not possible with present computers. However, a simulation can be done by considering primary and secondary collisions separately. An investigation of 20 keV argon ions incident obliquely on the (100) surface of a face-centered cubic copper crystal was done at angles from 29 to 61 degrees from normal. Results strongly support the concept of transparency, but indicate that focused collision sequences make very limited contributions to sputtering. Depending on the ion beam incidence angle, up to 25 percent of the sputtering may be due to random collision cascades initiated by deep primary collisions. The remainder is caused by surface collision mechanisms. Reflection of incident ions off surface atoms significantly affects argon-copper sputtering when the ions are obliquely incident. (Author)

Descriptors :   (*SINGLE CRYSTALS, ION BOMBARDMENT), (*COPPER, *SPUTTERING), CRYSTAL LATTICES, ION BEAMS, MODELS(SIMULATIONS), COMPUTER PROGRAMMING, THESES

Subject Categories : Physical Chemistry
      Crystallography

Distribution Statement : APPROVED FOR PUBLIC RELEASE