Accession Number : AD0724960

Title :   Research on the Sputtering of Multicomponent Materials by Ion Bombardment.

Descriptive Note : Status rept.,

Corporate Author : MINNESOTA UNIV MINNEAPOLIS PHYSICAL ELECTRONICS LAB

Personal Author(s) : Wehner,Gottfried K. ; Tarng,Ming L.

Report Date : MAY 1971

Pagination or Media Count : 45

Abstract : Experiments on cone formation in sputtering of multicomponent materials were continued. Auger electron spectroscopy of insulator surfaces poses no particular problems when one operates with the primary beam energy in regimes where the secondary electron coefficient is larger than unity. The main part of the work concerns in situ Auger electron spectroscopy studies of sputter deposition and sputter removal of Mo from various metal surfaces. The sputtering yield of Mo atoms from Cu, Au, Al expecially at low ion energies is much lower than that of Mo from Mo 200 eV Ar ions remove Mo atoms from an Al surface with a yield which is only 1/1000 of the bulk Mo yield. Mo monolayer islands protect the underlying Cu, Au, Al from being sputtered and this is responsible for the formation of cones. A significant conclusion is that the use of low energy ion bombardment for layer removal and determination of composition profiles may often lead to erroneous results. (Author)

Descriptors :   (*SURFACES, *ION BOMBARDMENT), (*MOLYBDENUM, *SPUTTERING), (*METAL COATINGS, SPUTTERING), DEFECTS(MATERIALS), VAPOR PLATING, ETCHING, ELECTRON MICROSCOPY, SURFACE PROPERTIES, COPPER ALLOYS, ALUMINUM ALLOYS, GOLD, THICKNESS, FILMS

Subject Categories : Coatings, Colorants and Finishes
      Fabrication Metallurgy

Distribution Statement : APPROVED FOR PUBLIC RELEASE