Accession Number : AD0734212
Title : Chemical Vapor Deposition Study.
Descriptive Note : Final rept.
Corporate Author : UTAH UNIV SALT LAKE CITY DIV OF MATERIALS SCIENCE AND ENGINEERING
Report Date : DEC 1971
Pagination or Media Count : 24
Abstract : The report discusses research on chemically vapor deposited (C.V.D.) tungsten. It was of interest to learn the mechanism by which the WF6 molecule was reduced by H2 on the substrate and also what was the mechanism by which the deposit grew. The effect of annealing on the mechanical properties of C.V.D. tungsten was studied in the temperature range of 800 to 1600C by hoop stress tests.
Descriptors : (*TUNGSTEN, DEPOSITION), (*METAL COATINGS, TUNGSTEN), ANNEALING, MECHANICAL PROPERTIES, TENSILE PROPERTIES, CHEMICAL REACTIONS, FLUORIDES
Subject Categories : Coatings, Colorants and Finishes
Distribution Statement : APPROVED FOR PUBLIC RELEASE