Accession Number : AD0743656

Title :   Method for Cleaning Semiconductors Surfaces,

Corporate Author : FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Personal Author(s) : Pultorak,Jerzy ; Wojcik,Ireneusz

Report Date : 04 APR 1972

Pagination or Media Count : 7

Abstract : The purpose of the invention is to elaborate the method of cleaning the surface of semiconductors in a hydrogen-containing protective atmosphere, which method could be applied as an independent process or conjointly with another process, e.g., fusion, vaporization, and which should make possible a considerably more effective cleaning of the surface of semiconductors.

Descriptors :   (*SEMICONDUCTORS, CLEANING), CONTROLLED ATMOSPHERES, DEOXIDATION(METALLURGY), SURFACES, PATENTS, POLAND

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE