Accession Number : AD0749236
Title : Fabrication and Evaluation of RF Sputtered Barium Titanate Thin Films.
Descriptive Note : Research and development technical rept.,
Corporate Author : ARMY ELECTRONICS COMMAND FORT MONMOUTH N J
Personal Author(s) : Pratt,I. H. ; Firestone,S. ; Frankel,H. C.
Report Date : AUG 1972
Pagination or Media Count : 41
Abstract : Structural, chemical, dielectric, and ferroelectric (limited) characteristics of RF sputtered barium titanate (BaTiO3) are described. Primary interest was to determine film capability for providing high capacitance devices for hybrid and thin film integrated circuits. The extent of ferroelectric film behavior was also of concern for charge storage use in the development of thin film image plates for miniature solid state facsimile cameras. Metal-dielectric-metal capacitor structures incorporating amorphous or polycrystalline BaTiO3 films were fabricated and evaluated. (Author)
Descriptors : (*INTEGRATED CIRCUITS, DIELECTRIC FILMS), (*DIELECTRIC FILMS, TITANATES), BARIUM COMPOUNDS, FERROELECTRIC MATERIALS, SPUTTERING, FIXED CAPACITORS
Subject Categories : Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE