Accession Number : AD0757770
Title : Rotation-dependence of the Photoelastic Effect.
Descriptive Note : Technical rept.,
Corporate Author : COLUMBIA UNIV NEW YORK DEPT OF CIVIL ENGINEERING AND ENGINEERING MECHANICS
Personal Author(s) : Mindlin,R. D.
Report Date : FEB 1973
Pagination or Media Count : 17
Abstract : The discovery, by Nelson and Lax, of the rotation-dependence of the photoelastic effect is reviewed in the light of Toupin's formula for the reciprocal dielectric susceptibility. The influences of the polarization gradient and a non-primitive crystal structure are also examined. (Author)
Descriptors : (*PHOTOELASTICITY, CRYSTALS), DEFORMATION, POLARIZATION, EQUATIONS OF MOTION, DISPERSION RELATIONS, STRESSES
Subject Categories : Solid State Physics
Distribution Statement : APPROVED FOR PUBLIC RELEASE