Accession Number : AD0757770

Title :   Rotation-dependence of the Photoelastic Effect.

Descriptive Note : Technical rept.,

Corporate Author : COLUMBIA UNIV NEW YORK DEPT OF CIVIL ENGINEERING AND ENGINEERING MECHANICS

Personal Author(s) : Mindlin,R. D.

Report Date : FEB 1973

Pagination or Media Count : 17

Abstract : The discovery, by Nelson and Lax, of the rotation-dependence of the photoelastic effect is reviewed in the light of Toupin's formula for the reciprocal dielectric susceptibility. The influences of the polarization gradient and a non-primitive crystal structure are also examined. (Author)

Descriptors :   (*PHOTOELASTICITY, CRYSTALS), DEFORMATION, POLARIZATION, EQUATIONS OF MOTION, DISPERSION RELATIONS, STRESSES

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE