Accession Number : AD0760051
Title : Beam Techniques for the Fabrication of Integrated Optics Circuits.
Descriptive Note : Final rept. 11 Sep 72-31 Jan 73,
Corporate Author : HUGHES RESEARCH LABS MALIBU CALIF
Personal Author(s) : Wolf,E. D. ; Garvin,H. L. ; Wilson,R. G.
Report Date : MAR 1973
Pagination or Media Count : 47
Abstract : Electron beam lithography and ion beam sputtering have been used to fabricate micron-size waveguides in thermally grown silicon dioxide, in chemical vapor deposited silicon dioxide, and in ion beam sputter- deposited silicon dioxide. In addition, waveguides were made directly in polymethyl methacrylate and the waveguide cross section was demonstrated as controllable using isochronal annealing above the glass- transition temperature (110 C) of PMMA. Waveguides with only a few hundred Angstrom edge roughness, were obtained. The factors limiting ultimate smoothness are not fully known, but it does appear from this work that extremely smooth and sufficiently small cross section structures for fundamental mode optical waveguiding can be made by a combination of electron and ion beam microfabrication techniques. (Author, modified-PL)
Descriptors : (*WAVEGUIDES, *MANUFACTURING), FEASIBILITY STUDIES, SPUTTERING, ION BEAMS, ELECTRON BEAMS, VAPOR PLATING, LITHOGRAPHY, SILICON DIOXIDE, ACRYLIC RESINS, INTEGRATED SYSTEMS
Subject Categories : Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE