Accession Number : AD0765726
Title : Method of Producing Light-Sensitive Material,
Corporate Author : ARMY FOREIGN SCIENCE AND TECHNOLOGY CENTER CHARLOTTESVILLE VA
Personal Author(s) : Dinaburg,M. S. ; Firsov,R. G. ; Dinaburg,G. A. ; Kozhatkinam,C. A. ; Titova,G. V.
Report Date : 12 MAR 1973
Pagination or Media Count : 3
Abstract : The Russian patent concerns a method of production of a light-sensitive material, which can be used for the production of a light-sensitive material, which can be used for the production of relief images in the printing and radio-electronic trades. In order to produce light-sensitive compounds, soluble in a wide range of organic solvents, and augmentation of light sensitivity of photo material, the method is proposed for production by application of a light-sensitive layer, including esters of naphthoquinonediazidesulfo acids and halogen-containing 4,4'-dioxydiphenylpropane, on a substrate.
Descriptors : (*PHOTOGRAPHIC MATERIALS, SYNTHESIS(CHEMISTRY)), PATENTS, USSR, HALOGENATED HYDROCARBONS, IODINE COMPOUNDS, SULFONIC ACIDS, PHOTOGRAPHIC IMAGES, ESTERS
Subject Categories : Organic Chemistry
Distribution Statement : APPROVED FOR PUBLIC RELEASE