Accession Number : AD0768444

Title :   Analysis of Semiconductor Structures by Nuclear and Electrical Techniques.

Descriptive Note : Final rept. Dec 70-Dec 72,

Corporate Author : CALIFORNIA INST OF TECH PASADENA DEPT OF ELECTRICAL ENGINEERING

Personal Author(s) : Bower,Robert W. ; Chu,Eri-K ; Haskell,Jacob D. ; Kiraki,Akio ; Kamoshida,Mototaka

Report Date : 05 MAY 1973

Pagination or Media Count : 54

Abstract : The report covers three relatively distinct areas of investigations; studies of Al2O3 and Si3N4 thin films, reactions in thin solid films and doping by ion implantation. Common to all this work is the use of ion backscattering spectrometry as the principle analytical tool, supported by a number of other techniques. Among these, x-ray diffraction and scanning electron microscopy were found to be particularly well suited to supplement backscattering. (Modified author abstract)

Descriptors :   (*SEMICONDUCTING FILMS, ION BOMBARDMENT), (*SEMICONDUCTORS, DOPING), SILICON DIOXIDE, SILICON, OXIDES, NITRIDES, ALUMINUM COMPOUNDS, HEAT TREATMENT, GALLIUM ARSENIDES, BAND THEORY OF SOLIDS, ELECTRICAL PROPERTIES, METAL FILMS, NICKEL ALLOYS, IRON ALLOYS

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE