Accession Number : AD0776949

Title :   Superconducting Thin Films in the Niobium-Vanadium and Titanium-Tantalum Systems.

Descriptive Note : Rept. for Jul 72-Jul 73,

Corporate Author : ARMY MOBILITY EQUIPMENT RESEARCH AND DEVELOPMENT CENTER FORT BELVOIR VA

Personal Author(s) : Spitzer,Hermann J.

Report Date : FEB 1974

Pagination or Media Count : 12

Abstract : Thin films of Nb-V and Ti-Ta allloys have been deposited by DC co-sputtering onto fused quartz at substrate temperatures of 700C. Deposition rates averaged 100A per minute and the thickness of all samples was of the order of 3000A. Jc-H characteristics were measured by a pulsed field-pulsed current technique and Tc's by monitoring the electrical resistance with temperature. Tc's in the Ti-Ta system are generally lower than in bulk, but considerably higher in the Nb-V system. The Jc's in both systems are comparatively high at low fields, but fall off rapidly with increasing magnetic fields. (Author)

Descriptors :   *Superconductors, Thin films, Niobium alloys, Vanadium alloys, Tantalum alloys, Titanium alloys, Transition temperature

Subject Categories : Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE