Accession Number : AD0777861
Title : Electrodevelopment of High-Resolution Integrated Circuit Masks.
Descriptive Note : Master's thesis,
Corporate Author : AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OHIO SCHOOL OF ENGINEERING
Personal Author(s) : Hoe,Gary L.
Report Date : DEC 1973
Pagination or Media Count : 86
Abstract : The report details an investigation of the electrodevelopment process as applied to mask-making. The process places masks and developer by-products. This method and an older ultrasonic developer agitation method are compared as to developer concentrations and lifetimes, processing times, exposure values and tolerances to exposure ranges, ability to reproduce sub-micron images, image bloom and pinholing, defect densities, and image density. Electrodevelopment is further characterized for electrode compatibility and cell power requirements. Prototype and final electrodevelopment tanks were designed and integrated with the existing mask-making facility. The final design was successfully demonstrated during the fabrication of a number of integrated circuits. (Modified author abstract)
Descriptors : *Integrated circuits, *Photolithography, *Masking, High resolution, Microminiaturization, Photographic processing, Photographic emulsions, Theses
Subject Categories : Electrical and Electronic Equipment
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE