Accession Number : AD0784486

Title :   The Mechanism of Photoprotection of Polystyrene Film by Some Ultraviolet Absorbers,

Corporate Author : DEFENCE STANDARDS LABS MARIBYRNONG (AUSTRALIA)

Personal Author(s) : George,G. A.

Report Date : 05 JUN 1973

Pagination or Media Count : 9

Abstract : The efficiency of three commercial ultraviolet absorbers, a 2-hydroxy benzophenone, a 2-hydroxy benzotriazole, and a nickel chelate, in preventing the photo-oxidation of polystyrene films has been measured. When compared with the calculated screening and phosphorescence quenching efficiency, it is found that (i) the nickel chelate protects the substrate by UV screening alone and is a poor photoprotector, and (ii) the 2-hydroxy benzophenone and 2-hydroxy benzotriazole are more efficient photoprotectors and protect by triplet energy transfer from excited polymer carbonyl impurity groups in addition to UV screening. (Author)

Descriptors :   *Polystyrene, *Oxidation resistance, Protection, Ultraviolet radiation, Energy transfer, Molecular energy levels, Quenching(Inhibition), Photochemical reactions, Australia, Chelate compounds, Oxidation, Benzophenones, Metal complexes, Nickel compounds

Subject Categories : Radiation and Nuclear Chemistry
      Atomic and Molecular Physics and Spectroscopy

Distribution Statement : APPROVED FOR PUBLIC RELEASE