Accession Number : AD0787291

Title :   Development of Chemical Polishing Techniques for Sapphire.

Descriptive Note : Final rept. Apr 73-Jul 74,

Corporate Author : LITTLE (ARTHUR D) INC CAMBRIDGE MASS

Personal Author(s) : Rossetti,Michael

Report Date : JUL 1974

Pagination or Media Count : 30

Abstract : The objective of this research program was to improve the surface finish of rough ground sapphire substrates by optimizing the pretreatment, the chemical polishing agent, and the polishing cycle. The optimum conditions for chemically polishing sapphire were found to be: preheating of the substrate in air to 1500-1550C for four (4) hours, phosphoric acid as the chemical polishing agent, polishing at 360-400C for ten (10) minutes, and polishing under autoclave conditions. This process has application to transparent armor fabrication. (Modified author abstract)

Descriptors :   *SAPPHIRE, COSTS, HEAT TREATMENT, PHOSPHORIC ACIDS, POLISHES, TEMPERATURE, AUTOCLAVES, ARMOR, TRANSPARENT PANELS

Subject Categories : Ceramics, Refractories and Glass
      Mfg & Industrial Eng & Control of Product Sys
      Armor

Distribution Statement : APPROVED FOR PUBLIC RELEASE