Accession Number : AD0815459
Title : DEPOSITION OF TUNGSTEN BY REDUCTION OF THE HEXAFLUORIDE WITH HYDROGEN IN THE VAPOR PHASE: PROCESS VARIABLES AND PROPERTIES OF THE DEPOSIT.
Descriptive Note : Summary technical rept. 1 Nov 63-31 Dec 65,
Corporate Author : NATIONAL BUREAU OF STANDARDS GAITHERSBURG MD
Personal Author(s) : Berkeley, Jean F. ; Brenner, Abner ; Reid, Walter E., Jr
Report Date : MAR 1967
Pagination or Media Count : 40
Abstract : An investigation of the variables involved in the deposition of tungsten from a mixture of tungsten hexafluoride and hydrogen has shown that the temperature of the substrate and the concentration of tungsten hexafluoride are the most important variables. The presence of hydrogen fluoride or chloride in the reacting gases diminished the rate of deposition. The deposits had about the same hardness, electrical conductivity and density as commercial wrought tungsten but had a higher purity. The tensile strength of the deposits was about 30,000 lb/sq in. and the stress within the deposits was of about the same magnitude. Codeposition of carbon, from carbon monoxide, greatly increased the hardness of the deposits. (Author)
Descriptors : (*TUNGSTEN, DEPOSITION), FLUORIDES, HYDROGEN, CHLORIDES, ELECTRICAL CONDUCTIVITY, TENSILE PROPERTIES, IMPURITIES, STRESSES, VAPOR PLATING, REFRACTORY METALS, THERMAL CONDUCTIVITY, DUCTILITY, THERMAL SHOCK, BRITTLENESS.
Subject Categories : Fabrication Metallurgy
Distribution Statement : APPROVED FOR PUBLIC RELEASE