Accession Number : AD0833373

Title :   SUBSTRATE CLEANING METHODS FOR THIN FILM DEPOSITION,

Corporate Author : GENERAL DYNAMICS/ASTRONAUTICS SAN DIEGO CA

Personal Author(s) : Kay, James, Jr

Report Date : 22 OCT 1959

Pagination or Media Count : 25

Abstract : A study of substrate cleaning methods for thin film evaporations was made. The study included investigation of ultrasonic cleaning, effects of water impurities, and tests for substrate cleanliness. Evaluation of cleaning procedures included the use of the electron microscope. The cleaning procedures developed during this study were tested on glass substrates only but they should be useful for a wide variety of other materials. Metzger's method forms the basis for the procedures developed in this study. This method uses a detergent solution in an ultrasonic cleaner. The final rinse is made in conductivity water. Since production of conductivity water is tedious and the necessary equipment was not available during this study, triple distilled water was used with some degree of success. The impurities in commercial distilled water produced stains on the substrate during the oven drying process. A method of forced gas blowing was devised to prevent water from drying on the substrate, thus eliminating the stain. The combination of ultrasonic cleaning, distilled water rinse, and forced gas blowing, produced substrates with undetectable contamination. (Author)

Descriptors :   (*SUBSTRATES, CLEANING), (*FILMS, DEPOSITION), VAPOR PLATING, VACUUM APPARATUS, ULTRASONIC RADIATION, ELECTRON MICROSCOPY, CLEANING COMPOUNDS, CONTAMINATION, MOLECULAR ELECTRONICS, WATER, IMPURITIES, GLASS, SURFACE PROPERTIES, ALUMINUM.

Subject Categories : Ceramics, Refractories and Glass
      Fabrication Metallurgy

Distribution Statement : APPROVED FOR PUBLIC RELEASE