Accession Number : AD0836041

Title :   FORMATION OF THIN-FILM PASSIVE DEVICES BY VACUUM TECHNIQUES,

Corporate Author : MELPAR FALLS CHURCH VA

Personal Author(s) : Hemmer, F. J. ; Smith, Richard C.

Report Date : 23 MAY 1965

Pagination or Media Count : 150

Abstract : In the period of April 19 through April 23, 1965, three U.S. Naval Avionics Facility (NAFI) personnel were given detailed instruction on the techniques and instructions applicable to the formation and characterization of passive devices. Details of the equipment, materials, vendors, deposition procedure, monitoring techniques and device characterization were given by Melpar personnel. Articles covering much of the passive device work carried out at Melpar were furnished to NAFI personnel. Approximately 130 extreme environment capacitors and 90 resistors were formed under the observation of NAFI personnel. Of the devices formed, approximately 50% of the capacitors met desired specifications and 50% of the resistors met the design objectives. Of the capacitors, approximately 90% were useful at somewhat lower temperatures than those called for in the specifications. List of key words denoting principal coverage of report: (1) Borosilicate Capacitors; (2) Dysprosium Oxide Capacitors; (3) Evaporated Thin-Films; (4) Rhenium Resistors; (5) Thin-Film Passive Devices; (6) Vacuum Deposition Techniques. (Author)

Descriptors :   (*INTEGRATED CIRCUITS, MANUFACTURING), INSTRUCTION MANUALS, VAPOR PLATING, VACUUM APPARATUS, SUBSTRATES, DIELECTRIC FILMS, METAL FILMS, ELECTRICAL PROPERTIES, FIXED CAPACITORS, FIXED RESISTORS, DYSPROSIUM COMPOUNDS, OXIDES, RHENIUM, PERFORMANCE(ENGINEERING), ENVIRONMENTAL TESTS, STABILITY, SPECIFICATIONS.

Subject Categories : Electrical and Electronic Equipment
      Fabrication Metallurgy

Distribution Statement : APPROVED FOR PUBLIC RELEASE