Accession Number : AD0841534

Title :   POLYTECHNIC INSTITUTE, BRESLAU. SCIENTIFIC PAPERS, NO. 7, 1964 (SELECTED ARTICLES),

Corporate Author : FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OH

Personal Author(s) : Dembicka-Jellonkowa, Stanislawa ; Idczak, Elzbieta

Report Date : 03 OCT 1967

Pagination or Media Count : 24

Abstract : The effect of technological conditions and thickness on the resistivity of chromium films was investigated on films ranging in thickness from 70 to 1200A. Films with the lowest resistivity of 60 micro-ohms cm are obtained in vacuum, improved by a getter, during condensation on a substrate heated to 360C. Films with the highest resistivity of 140 micro-ohms cm are obtained at a substrate temperature of 50C in a vacuum of 0.0001 mm Hg. Two groups of thin chromium films, obtained under most and least favorable gas adsorption conditions, were investigated. The reflection coefficients R and R' from the air side and substrate side, respectively, and the transmittance coefficient T were measured in the wavelength lambda ranging from 1000 to 10,000A on films varying in thickness d from 100 to 1000A. (Author)

Descriptors :   (*METAL FILMS, ELECTRICAL RESISTANCE), (*OPTICAL PROPERTIES, METAL FILMS), CHROMIUM, THICKNESS, CONDENSATION, SUBSTRATES, HIGH TEMPERATURE, VAPOR PLATING, VACUUM, ADSORPTION, REFLECTION, LIGHT TRANSMISSION, IMPURITIES, POLAND.

Subject Categories : Metallurgy and Metallography
      Fabrication Metallurgy

Distribution Statement : APPROVED FOR PUBLIC RELEASE