Accession Number : AD0866449

Title :   Methods of Producing Thin Films,

Corporate Author : FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OH

Personal Author(s) : Lebeda, Stanislav

Report Date : 12 DEC 1969

Pagination or Media Count : 23

Abstract : The report describes various methods of producing thin films, especially for microelectronics. In addition to the classical methods of forming thin films by vacuum vapor deposition, it also describes processes of diode sputtering and modern methods of cathode sputtering by means of a third electrode and a magnetic and high-frequency field which have a large number of advantages. These latter-mentioned methods enable the formation not only of films of metals and their alloys, but also semiconductor and especially insulation films. The features of these methods may advantageously be used in selecting capacitors and for the passivation of active surfaces in microelectronic circuits. (Author)

Descriptors :   *DEPOSITION), (*MICROELECTRONICS, VAPOR PLATING), (*METAL FILMS, VACUUM APPARATUS, SPUTTERING, METAL FILMS, DIELECTRIC FILMS, SEMICONDUCTING FILMS, CZECHOSLOVAKIA.

Subject Categories : Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE