Accession Number : AD0869162
Title : The Technology of Epitaxial Silicon Layers from SiCl4.
Descriptive Note : Research and development rept. Mar 68-Jun 69,
Corporate Author : NAVAL ELECTRONICS LAB CENTER SAN DIEGO CA
Personal Author(s) : Symanski, J. J.
Report Date : 30 JAN 1970
Pagination or Media Count : 23
Abstract : Procedures for the deposition of epitaxial layers for integrated circuits were developed, and the capacity to produce device-quality epitaxial layers was successfully established. Specific problems that occurred were analyzed and corrective procedures outlined. (Author)
Descriptors : *EPITAXIAL GROWTH), *MANUFACTURING), (*SILICON, (*SILICON COATINGS, (*INTEGRATED CIRCUITS, SILICON COATINGS), SURFACE PROPERTIES, CRYSTAL GROWTH, QUALITY CONTROL.
Subject Categories : Electrical and Electronic Equipment
Coatings, Colorants and Finishes
Mfg & Industrial Eng & Control of Product Sys
Distribution Statement : APPROVED FOR PUBLIC RELEASE