Accession Number : AD0869162

Title :   The Technology of Epitaxial Silicon Layers from SiCl4.

Descriptive Note : Research and development rept. Mar 68-Jun 69,

Corporate Author : NAVAL ELECTRONICS LAB CENTER SAN DIEGO CA

Personal Author(s) : Symanski, J. J.

Report Date : 30 JAN 1970

Pagination or Media Count : 23

Abstract : Procedures for the deposition of epitaxial layers for integrated circuits were developed, and the capacity to produce device-quality epitaxial layers was successfully established. Specific problems that occurred were analyzed and corrective procedures outlined. (Author)

Descriptors :   *EPITAXIAL GROWTH), *MANUFACTURING), (*SILICON, (*SILICON COATINGS, (*INTEGRATED CIRCUITS, SILICON COATINGS), SURFACE PROPERTIES, CRYSTAL GROWTH, QUALITY CONTROL.

Subject Categories : Electrical and Electronic Equipment
      Coatings, Colorants and Finishes
      Mfg & Industrial Eng & Control of Product Sys

Distribution Statement : APPROVED FOR PUBLIC RELEASE