Accession Number : AD0874840
Title : Manufacturing Techniques for Application of a Duplex W/Si-W Coating on Tantalum Components.
Descriptive Note : Final rept. 1 Aug 66-30 Jun 70,
Corporate Author : TRW INC CLEVELAND OH
Personal Author(s) : Fisch, Herbert A.
Report Date : JUL 1970
Pagination or Media Count : 265
Abstract : The report summarizes the results of a program to establish manufacturing techniques for applying the duplex W/Si-W coating on tantalum components. The duplex W/Si-W coating consists of an integrally bonded tungsten barrier layer interposed between an oxidation resistant tungsten disilicide surface coating and the tantalum alloy substrate. The tungsten barrier layer was applied using different techniques, e.g., chemical vapor deposition, slurry spray, or electrophoretic deposition, each followed by vacuum sintering. The silicide coating was formed by either vacuum-pack or slip-pack processes. (Author)
Descriptors : *TANTALUM ALLOYS), (*REFRACTORY COATINGS, TUNGSTEN, SILICIDES, MANUFACTURING, BARRIER COATINGS, SLURRY COATING, VAPOR PLATING, ELECTROPHORETIC COATINGS, HEAT SHIELDS.
Subject Categories : Coatings, Colorants and Finishes
Distribution Statement : APPROVED FOR PUBLIC RELEASE