Accession Number : AD0893221
Title : Manufacturing Methods and Technology Measure. Ultraprecision Integrated-Circuit Photomasks.
Descriptive Note : Final technical rept. 1 Dec 69-31 Jan 72,
Corporate Author : RCA SOLID STATE DIV SOMERVILLE NJ
Personal Author(s) : Stacy, Irving F. ; Conley, Eugene W.
Report Date : FEB 1972
Pagination or Media Count : 116
Abstract : The objective of the manufacturing methods and technology measure (MMT) was to establish and demonstrate production techniques for ultraprecision integrated-circuit (IC) photomasks. The effectiveness of these techniques was to be verified by demonstrating the production capability for producing photomasks to a high degree of image accuracy. The effectiveness was to be further demonstrated by using the ultraprecision photomasks to manufacture IC's having better quality and higher yield. Engineering samples of photomask sets were manufactured and delivered to the contracting agency and to an in-house transistor wafer manufacturing area for pilot-line-production runs and evaluation of improved capabilities as the manufacturing methods and technology program progressed. This final report documents the successful accomplishment of all the goals of this MMT. (Author)
Descriptors : *MASKING), (*INTEGRATED CIRCUITS, CHROMIUM, PRODUCTION CONTROL, COLLOIDS.
Subject Categories : Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE