Accession Number : AD0905641
Title : Production Engineering Measure for an Electron-Beam Machine and Microwave Transistors.
Descriptive Note : Quarterly rept. no. 4, 1 Jan-1 Apr 72,
Corporate Author : TEXAS INSTRUMENTS INC DALLAS
Personal Author(s) : Pankratz, John M. ; Ch'en, Daniel R. ; Varnell, Gilbert L.
Report Date : 01 APR 1972
Pagination or Media Count : 29
Abstract : The objective of this program is to establish and demonstrate, under production conditions, the use of electron-beam photolithography in the fabrication of integrable microwave transistors. During the fourth quarter of the contract, slice lot EBT-5 was processed to completion. A complete evaluation of this lot was made, and 20 engineering samples were shipped along with test results. Several units had maximum available gain as high as 7.24 dB at 6 GHz. A new transistor, ML-220, was designed to utilize the slower etch rate of electron-beam irradiated gold and the e-beam machine's small-geometry capability. Several lots of slices containing this new, potentially superior transistor were started. Automatic pattern registration was utilized on approximately 50% of the fields to further evaluate this operation on slices going through the transistor fabrication steps. (Author)
Descriptors : (*TRANSISTORS, MANUFACTURING), (*ELECTRON BEAMS, PHOTOENGRAVING), LITHOGRAPHY, MICROWAVE FREQUENCY, AUTOMATIC, ETCHING, GOLD, STYRENE PLASTICS, ALIGNMENT, SUPERHIGH FREQUENCY, GAIN, SPECIFICATIONS, NOISE(RADIO).
Subject Categories : Electrical and Electronic Equipment
Distribution Statement : APPROVED FOR PUBLIC RELEASE