Accession Number : ADA018213

Title :   Long Term Memory in Junction Devices Using Multivalent Trapping Impurities in Silicon.

Descriptive Note : Final rept. 1 Feb-30 Jun 75,

Corporate Author : CALIFORNIA UNIV LOS ANGELES SCHOOL OF ENGINEERING AND APPLIED SCIENCE

Personal Author(s) : Domingo,George ; Holm-Kennedy,James W. ; Kingsley,William ; Nash,James G.

Report Date : OCT 1975

Pagination or Media Count : 127

Abstract : Various multivalent dopants were investigated with the goal of obtaining nonvolatile multilevel memory devices in silicon using the Field Induced Trapping (FIT) effect. The test structures included Schottky diodes and resistive bars fabricated in silicon substrates suitably doped with multivalent dopants. Novel device effects were observed and are described. A model for a negative differential resistance Schottky barrier oscillator is proposed. Oscillations with frequencies voltage turnable over three decades were observed. Thermal switching in resistive bars is described and a theoretical treatment presented. Two separate models employing entirely different mechanisms are analyzed. A theoretical treatment on trapping effects in p-n junctions under low injection conditions is presented. (Author)

Descriptors :   *Schottky barrier devices, *Semiconductor diodes, *Semiconductor junctions, Trapping(Charged particles), Impurities, Epitaxial growth, Silicon, Switching, Wafers, Zinc, Electrons, Etching, Memory devices, Valence, Doping

Subject Categories : Electrical and Electronic Equipment
      Solid State Physics

Distribution Statement : APPROVED FOR PUBLIC RELEASE