Accession Number : ADA112233

Title :   A Proximity effect Correction Program for Electron Beam Lithography.

Descriptive Note : Technical rept.,

Corporate Author : ARMY ELECTRONICS RESEARCH AND DEVELOPMENT COMMAND FORT MONMOUTH NJ ELECTRONICS TECHNOLOGY/DEVICES LAB

Personal Author(s) : Berkowitz,H L ; Lux,R A

PDF Url : ADA112233

Report Date : Jan 1982

Pagination or Media Count : 17

Abstract : A proximity effect correction program implementing the self-consistent correction algorithm has been developed. The program calculates recommended electron beam exposures given as input, the pattern to be written and the beam scattering parameters. Predicted dose patterns resulting from the recommended exposures are also calculated. Results of sample calculations are shown. (Author)

Descriptors :   *ELECTRON BEAMS, *DISTORTION, *COMPUTER AIDED DESIGN, *PHOTOLITHOGRAPHY, COMPUTER PROGRAMS, GEOMETRY, ALGORITHMS, EXPOSURE(GENERAL), INPUT, PREDICTIONS, DOSIMETRY, PATTERNS, SCATTERING, TRANSVERSE, THICKNESS, SUBSTRATES, RESISTORS, CORRECTIONS, COMPUTATIONS, SIZES(DIMENSIONS), ELECTRON FLUX, RESOLUTION, INTEGRATED CIRCUITS, CONSISTENCY, RANGE(DISTANCE)

Subject Categories : Computer Programming and Software
      Printing and Graphic Arts
      Particle Accelerators

Distribution Statement : APPROVED FOR PUBLIC RELEASE