Accession Number : ADA112574

Title :   Study of Mechano-Chemical Machining of Ceramics and the Effect on Thin Film Behavior.

Descriptive Note : Annual technical rept. 1 May 80-30 Apr 81,


Personal Author(s) : Vora,H ; Stokes,R J

PDF Url : ADA112574

Report Date : Jun 1981

Pagination or Media Count : 38

Abstract : Efforts were made to finish the surfaces of single-crystal MgO, Si, and both single-crystal and tape-cast Al2O3 using the technique of mechano-chemical polishing. In this technique, the emphasis is on employing an abrasive whose hardness is less than that of the workpiece to produce damage-and scratch-free surfaces that are also flat. An evidence for mechano-chemical polishing in the form of scratch-free surfaces was not obtained in the case of MgO, which was polished using talc, rock salt, calcite, and fluorite as abrasives. The mechano-chemical polishing effects, however, were readily observed when Si was polished using CaCO3, BaCO3, and MgO as abrasives, and when Al2O3 was polished on a plate of window glass using no abrasive. Mechano-chemically-polished surfaces were characterized using RHEED, profilometry, interferometry, optical microscopy, and electron spectroscopy for chemical analysis. (Author)

Descriptors :   *Ceramic materials, *Surface finishing, *Polishing, *Machine tools, *Machining, *Chemical cleaning, Thin films, Feasibility studies, Single crystals, Abrasives, Fracture(Mechanics), Deformation, Dislocations, Physical properties, Aluminates, Magnesium oxides, Silicones, Sapphire, Etching, Photomicrography, Spectrum analysis, Test methods

Subject Categories : Ceramics, Refractories and Glass

Distribution Statement : APPROVED FOR PUBLIC RELEASE